Optical amplification and stability of spiroquaterphenyl compounds and blends
Optical amplification and stability of spiroquaterphenyl compounds and blends
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DOI:
10.2971/jeos.2015.15007
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发表时间:
2015-02
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通讯作者:
T. Fuhrmann-Lieker;J. Lambrecht;Nicolai M. Hoinka;M. Kiurski;A. Wiske;G. Hagelstein;N. Yurttagül;M. Abdelawwad;H. Wilke;F. Messow;H. Hillmer;J. Salbeck
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文献类型:
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作者:
T. Fuhrmann-Lieker;J. Lambrecht;Nicolai M. Hoinka;M. Kiurski;A. Wiske;G. Hagelstein;N. Yurttagül;M. Abdelawwad;H. Wilke;F. Messow;H. Hillmer;J. Salbeck
In this contribution, we present a systematic investigation on a series of spiroquaterphenyl compounds optimised for solid state lasing in the near ultraviolet (UV). Amplified spontaneous emission (ASE) thresholds in the order of 1 μJ/cm^2 are obtained in neat (undiluted) films and blends, with emission peaks at 390±1 nm for unsubstituted and meta-substituted quaterphenyls and 400±4 nm for para-ether substituted quaterphenyls. Mixing with a transparent matrix retains a low threshold, shifts the emission to lower wavelengths and allows a better access to modes having their intensity maximum deeper in the film. Chemical design and blending allow an independent tuning of optical and processing properties such as the glass transition.