Development of low-fluorescence thick photoresist for high-aspect-ratio microstructure in bio-application
Development of low-fluorescence thick photoresist for high-aspect-ratio microstructure in bio-application
复制标题
DOI：
10.1063/1.4917511
复制
发表时间：
2015-03-01
期刊：
影响因子：
3.2
通讯作者：
Suzuki, T.
中科院分区：
文献类型：
--
作者：
Tamai, H.;Maruo, K.;Suzuki, T.
在本研究中，我们提出并评估了一种新型的低自发荧光光致抗蚀剂（SJI光致抗蚀剂），用于生物应用，例如，在基因分析和细胞分析中。旋涂的SJI光刻胶具有10至几百微米的宽厚度范围，并且成功地制造了纵横比大于7且微图案小于2 μ m的光刻胶微结构。SJI光致抗蚀剂的发射光谱强度比广泛使用的SU-8光致抗蚀剂的发射光谱强度低80%以上。为了评估使用所提出的光致抗蚀剂在生物应用中用于荧光观察的有效性，我们展示了由SJI光致抗蚀剂组成的染色体延伸装置。SJI光致抗蚀剂的归一化对比度比SU-8光致抗蚀剂的归一化对比度提高了50%，因此，SJI光致抗蚀剂是生物应用的通用工具。(C)2015 AIP Publishing LLC.
In this study, we propose and evaluate a novel low-auto-fluorescence photoresist (SJI photoresist) for bio-application, e.g., in gene analysis and cell assay. The spin-coated SJI photoresist has a wide thickness range of ten to several hundred micrometers, and photoresist microstructures with an aspect ratio of over 7 and micropatterns of less than 2 mu m are successfully fabricated. The emission spectrum intensity of the SJI photoresist is found to be over 80% less than that of the widely used SU-8 photoresist. To evaluate the validity of using the proposed photoresist in bio-application for fluorescence observation, we demonstrate a chromosome extension device composed of the SJI photoresist. The normalized contrast ratio of the SJI photoresist exhibits a 50% improvement over that of the SU-8 photoresist; thus, the SJI photoresist is a versatile tool for bio-application. (C) 2015 AIP Publishing LLC.