Chemical bonds and elemental compositions of BCxNy layers produced by chemical vapor deposition with trimethylamine borane, triethylamine borane, or trimethylborazine
Chemical bonds and elemental compositions of BCxNy layers produced by chemical vapor deposition with trimethylamine borane, triethylamine borane, or trimethylborazine
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DOI：
10.1002/xrs.2387
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发表时间：
2012-07
影响因子：
1.2
通讯作者：
P. Hoffmann;O. Baake;M. Kosinova;B. Beckhoff;A. Klein;B. Pollakowski;V. Trunova;V. Sulyaeva;F. A. Kuznetsov;W. Ensinger
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文献类型：
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作者：
P. Hoffmann;O. Baake;M. Kosinova;B. Beckhoff;A. Klein;B. Pollakowski;V. Trunova;V. Sulyaeva;F. A. Kuznetsov;W. Ensinger
BCxNy 薄膜是通过化学气相沉积工艺由单一来源前驱体生产的。硼烷作为前体在低压条件和 700 °C 的温度下引入，而环硼氮烷在 400 °C 下处理，并在 40 W 的电功率输入下进行等离子体增强。此外，分别使用 H2、He、N2 和 NH3 作为惰性或反应气体。通过X射线光电子能谱和基于同步辐射的全反射X射线荧光结合近边X射线吸收精细结构对沉积在Si(100)基底上的薄膜进行化学表征，并通过能量色散X射线光谱对沉积在Si(100)基底上的薄膜进行元素定量。对结果进行严格比较。通过应用不含 NH3 的硼烷，鉴定出具有主要碳化物特征的化合物，而在硼烷中添加 NH3 时，则普遍具有氮化物特征。在使用环硼氮烷进行合成的情况下，在应用所有辅助气体时发现氮化特性。对于这两个基团，提出了源自能量色散 X 射线光谱的化学计量公式：碳化物区域为 B3.5–4C4N2–2.5，氮化物区域为 B3.5C1.5N5。版权所有 © 2012 约翰·威利父子有限公司
BCxNy films were produced from single-source precursors in a chemical vapor deposition process. The boranes were introduced as precursors at low pressure conditions and at a temperature of 700 °C, whereas the borazine was handled at 400 °C and with a plasma enhancement at an electrical power input of 40 W. Additionally, as inert or reactive gases, H2, He, N2, and NH3, respectively, were used. The films deposited on Si(100) substrates were chemically characterized by X-ray photoelectron spectroscopy and by synchrotron radiation-based total-reflection X-ray fluorescence combined with near-edge X-ray absorption fine structure and quantified elementally by energy-dispersive X-ray spectroscopy. The results are critically compared. With the application of boranes without NH3, compounds with a dominating carbidic character were identified, whereas with the addition of NH3 to the boranes, a nitridic character was prevalent. In case of using borazine for the synthesis, the nitridic character was found at the application of all auxiliary gases. For both groups stoichiometric formulas derived from energy-dispersive X-ray spectroscopy are proposed: B3.5–4C4N2–2.5 for the carbidic region and B3.5C1.5N5 for the nitridic region. Copyright © 2012 John Wiley & Sons, Ltd.