Microstructure patterning on glass substrate by imprinting process
Microstructure patterning on glass substrate by imprinting process
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DOI：
10.1016/j.mee.2009.02.015
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发表时间：
2009-04-01
影响因子：
2.3
通讯作者：
Sung, C. K.
中科院分区：
文献类型：
--
作者：
Hung, Y. M.;Lu, Y. J.;Sung, C. K.
本文提出了一种将微尺度图形从硅模转移到玻璃基板上的热压印工艺。采用有限元模拟和实验相结合的方法对微尺度玻璃图形的成形性进行了研究。本文采用K-PG375作为玻璃衬底。首先建立了具有给定边界条件的周期性微结构的有限元模型。定义了压印工艺参数如压印温度、压印速度、压印时间等几何参数以及性能指标填充因子。根据模拟得到的激光流动的压力和速度分布，得出了玻璃形成的机理，为后续的实验研究提供了指导。实验是在自制的热压机上进行的。根据模拟条件调整工艺参数，并用扫描电子显微镜观察模具的几何形状和过渡图案。模拟结果与实验结果吻合较好，并成功地在12.5 mm的正方形玻璃基板上印制了2微米的光栅图形。(C)2009爱思唯尔B.V.保留所有权利。
This paper proposed a thermal imprinting process for transferring microscale patterns from a silicon mold to a glass substrate. Both finite element simulation and experiment were conducted to investigate the formability of microscale glass patterns. Herein, K-PG375 was used as the glass substrate. An FEM model of the periodic microstructures with prescribed boundary conditions was first established. Then, the geometrical parameters, such as aspect ratio, duty ratio, and substrate ratio, process parameters including imprinting temperature, velocity, holding time, etc., as well as the performance index, filling factor, were defined. From the simulated pressure and velocity distributions of lass flow, the mechanism of glass forming was obtained, which provided a guideline for performing the following experimental study. The experiments were conducted by using a homemade thermal imprinting machine. The process parameters were tuned according to the simulation conditions and an SEM was used for observing the geometries of the mold and the transferred patterns. Good agreement between simulation and experimental results were achieved and the 2 mu m grating patterns were successfully imprinted on a 12.5 mm square glass substrate. (C) 2009 Elsevier B.V. All rights reserved.