Polymerized hexamethyldisilazane coated on equiatomic TiNi shape memory alloy using DC-pulsed plasma assisted chemical vapor deposition
Polymerized hexamethyldisilazane coated on equiatomic TiNi shape memory alloy using DC-pulsed plasma assisted chemical vapor deposition
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DOI：
10.1016/j.surfcoat.2007.09.052
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发表时间：
2008-03-15
影响因子：
5.4
通讯作者：
Wu, Shyi-Kaan
中科院分区：
文献类型：
--
作者：
Chen, Chien-Hui;Yang, Mu-Rong;Wu, Shyi-Kaan
采用非对称双极直流脉冲等离子体辅助化学气相沉积（PACVD）技术，在六甲基二硅氮烷（HMDSN）和氩气（Ar）的混合气体中，室温下在Ti50Ni50形状记忆合金上沉积了SiC：H类有机薄膜。等离子体聚合HMDSN（PPHMDSN）薄膜的沉积速率比射频工艺快，PPHMDSN薄膜不仅提高了耐蚀性，而且使腐蚀电流密度衰减了4个数量级。薄膜的表面形貌非常光滑和均匀，表面粗糙度的均方根在3和5 nm之间。在含有过氧化物或自由基的类有机薄膜上接枝聚合物丙烯酰胺（AAm），可以改善TiNi形状记忆合金的生物相容性。(C)2007 Elsevier B.V.保留所有权利。
SiC:H organic-like thin films are deposited on Ti50Ni50 shape memory alloy by asymmetric bipolar DC-pulsed plasma assisted chemical vapor deposition (PACVD) in the gas mixture of hexamethyldisilazane (HMDSN) and Ar at room temperature. The deposition rate of the plasma-polymerized HMDSN (PPHMDSN) thin film is faster than that of RF process and the PPHMDSN thin films not only enhance the corrosion resistance but make the corrosion current density decay four orders. The surface morphology of the films is very smooth and uniform and the root mean square of surface roughness is in the range between 3 and 5 nm. The organic-like thin films containing peroxides or free radicals can be grafted with polymer acrylamide (AAm) which can improve the biocompatibility of TiNi shape memory alloy. (C) 2007 Elsevier B.V. All rights reserved.