Improvement of Conductivity by incorporation of Boron atoms in Hydrogenated Amorphous Carbon Films fabricated by Plasma CVD methods and Electrochemical Properties of the films
Improvement of Conductivity by incorporation of Boron atoms in Hydrogenated Amorphous Carbon Films fabricated by Plasma CVD methods and Electrochemical Properties of the films
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等离子CVD法制备的氢化非晶碳薄膜中掺入硼原子提高电导率及薄膜的电化学性能
DOI：
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发表时间：
2011
期刊：
影响因子：
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通讯作者：
Seiji Tastuta
中科院分区：
文献类型：
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作者：
Kensuke Honda;Hiroshi Naragino;Kosuke Yoshinaga;Seiji Tastuta
