Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β‐Ta2O5
Effects of Temperature and Reagent Concentration on the Morphology of Chemically Vapor Deposited β‐Ta2O5
复制标题
温度和试剂浓度对化学气相沉积 β-Ta2O5 形貌的影响
DOI：
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发表时间：
1995
期刊：
影响因子：
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通讯作者：
D. Stinton
中科院分区：
文献类型：
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作者：
Y. Bae;Woo Y. Lee;D. Stinton
在1000°-1300 ° C和660 Pa的温度范围内，用TaCl 5与H2和CO2反应，在热等静压Si_3N_4上沉积了β-Ta_2O_5晶体涂层。Ta_2O_5涂层通常由2-3 μm的颗粒组成，形成无孔的涂层形貌。然而，一致地观察到在沉积态表面上存在微裂纹。涂层的表面形貌，纹理和生长速率进行了检查作为沉积参数的函数。
Crystalline β-Ta2O5 coatings were deposited on hot-isostatically-pressed Si3N4 by reacting TaCl5 with H2 and CO2 in the temperature range of 1000°–1300°C and at a pressure of 660 Pa. The Ta2O5 coatings generally consisted of wellcoalesced 2–3 μm grains, resulting in the formation of a nonporous coating morphology. However, the presence of microcracks on the as-deposited surface was consistently observed. The surface morphology, texture, and growth rate of the coatings were examined as a function of deposition parameters.