Chemomechanical surface patterning and functionalization of silicon surfaces using an atomic force microscope
Chemomechanical surface patterning and functionalization of silicon surfaces using an atomic force microscope
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DOI：
10.1063/1.1535267
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发表时间：
2003-02-03
影响因子：
4
通讯作者：
Davis, RC
中科院分区：
文献类型：
--
作者：
Wacaser, BA;Maughan, MJ;Davis, RC
纳米尺度的表面修饰和图案化是科学的前沿，在生物医学技术和纳米电子学中具有重要的应用前景。在这里，我们展示了原子力显微镜(AFM)可以用来同时图案化和功能化氢端基硅(111)表面。原子力显微镜探针被用来在反应分子存在的情况下破坏Si-H键和Si-Si键，这些反应分子共价键合在划片的硅表面上。产生了功能化的分子贴片和图案化的线条。通过改变尖端的作用力，得到了最小为30 nm的线宽。(C)2003年美国物理研究所。
Surface modification and patterning at the nanoscale is a frontier in science with significant possible applications in biomedical technology and nanoelectronics. Here we show that an atomic force microscope (AFM) can be employed to simultaneously pattern and functionalize hydrogen-terminated silicon (111) surfaces. The AFM probe was used to break Si-H and Si-Si bonds in the presence of reactive molecules, which covalently bonded to the scribed Si surface. Functionalized patches and patterned lines of molecules were produced. Linewidths down to 30 nm were made by varying the force at the tip. (C) 2003 American Institute of Physics.