Observation of the Creations and Annihilations of Local Current Paths in HfO2 thin films on Pt by Ultrahigh Vacuum Conductive-Atomic Force Microscopy : Evidence of Oxygen SpillOver during the Forming Process

Observation of the Creations and Annihilations of Local Current Paths in HfO2 thin films on Pt by Ultrahigh Vacuum Conductive-Atomic Force Microscopy : Evidence of Oxygen SpillOver during the Forming Process
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用超高真空导电原子力显微镜观察 Pt 上 HfO2 薄膜局部电流路径的产生和消灭:形成过程中氧气溢出的证据

DOI:
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发表时间:
2009
期刊:
Japanese Journal of Applied Physics (accepted)(掲載確定)(頁未定)
影响因子:
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通讯作者:
N. Sasaki
N. Sasaki
中科院分区:
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文献类型:
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作者:
白石幸英;山口淳一;戸嶋直樹;N. Sasaki

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