Analysis of L21-ordering in full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing
Analysis of L21-ordering in full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing
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DOI：
10.1063/1.3075989
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发表时间：
2009-02
影响因子：
3.2
通讯作者：
Y. Takamura;R. Nakane;S. Sugahara
中科院分区：
文献类型：
--
作者：
Y. Takamura;R. Nakane;S. Sugahara
本文提出了一种新的评价全heusler合金原子有序度的分析方法，该方法是对常用的Webster模型的扩展。我们的模型可以给出准确的L21结构原子有序度的物理形式，包括对完全无序的A2结构的修正，即该模型可以直接评价比完全有序的b2结构更低有序结构下的L21有序度。将该模型应用于快速热退火形成的全heusler Co2FeSi合金薄膜。在TA=800℃下形成的薄膜显示出L21有序度为83%，B2有序度为97%。
The authors developed a new analysis approach for evaluation of atomic ordering in full-Heusler alloys, which is extension of the commonly used Webster model. Our model can give accurate physical formalism for the degree of atomic ordering in the L21 structure, including correction with respect to the fully disordered A2 structure, i.e., the model can directly evaluate the degree of L21 ordering under a lower ordering structure than the complete B2-ordering structure. The proposed model was applied to full-Heusler Co2FeSi alloy thin films formed by rapid thermal annealing. The film formed at TA=800 °C showed a high degree of L21 ordering of 83% under a high degree of B2 ordering of 97%.