State of the art in thin film thickness and deposition rate monitoring sensors
State of the art in thin film thickness and deposition rate monitoring sensors
复制标题
最先进的薄膜厚度和沉积速率监测传感器
DOI：
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发表时间：
2005
期刊：
影响因子：
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通讯作者：
K. Robbie
中科院分区：
文献类型：
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作者：
C. Buzea;K. Robbie
原位监测参数是薄膜制备过程中必不可少的。其中，厚度和沉积速率的控制往往是最重要的，在实现技术开发依赖于薄膜微观结构的物理现象所必需的再现性。本文介绍了厚度和沉积速率传感器的类型和它们的理论和现象学背景，强调它们的性能，以及优点和缺点。
In situ monitoring parameters are indispensable for thin film fabrication. Among them, thickness and deposition rate control are often the most important in achieving the reproducibility necessary for technological exploitation of physical phenomena dependent on film microstructure. This review describes the types of thickness and deposition rate sensors and their theoretical and phenomenological background, underlining their performances, as well as advantages and disadvantages.