Hydrophobic Films by Atmospheric Plasma Curing of Spun-On Liquid Precursors
Hydrophobic Films by Atmospheric Plasma Curing of Spun-On Liquid Precursors
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DOI：
10.1021/la803791j
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发表时间：
2009-02-17
期刊：
影响因子：
3.9
通讯作者：
Hicks, Robert F.
中科院分区：
文献类型：
--
作者：
Barankin, Michael D.;Gonzalez, Eleazar, II;Hicks, Robert F.
采用低温常压等离子体处理液态氟烷基硅烷前驱体，在玻璃和丙烯酸酯样品上制备了疏水涂层。将氟烷基硅烷前体溶解在异辛烷中并以550 rpm旋转到基底上。然后将样品暴露于由氮等离子体产生的反应性物质。等离子体在27.12 MHz的射频下以7.4 W/cm（2）的氦气中的2.3 vol % N-2操作。涂层的表面能的总分量和极性分量被发现分别等于11.0和1.2达因/厘米。在涂覆的玻璃和丙烯酸表面上分别测得110度和106度的平均水接触角。X射线光电子能谱显示，在处理后，氟烷基配体在Si原子上保持完整，F/C原子比为2.23。
Hydrophobic coatings have been produced on glass and acrylic samples by using a low-temperature atmospheric pressure plasma to polymerize liquid fluoroalkylsi lane precursors. The fluoroalkylsi lane precursor was dissolved in isooctane and spun onto the substrate at 550 rpm. The sample was then exposed to the reactive species generated from a nitrogen plasma. The plasma was operated with 2.3 vol % N-2 in helium at 7.4 W/cm(2) at a radio frequency of 27.12 MHz. The total and polar component of the coating's surface energy was found to equal 11.0 and 1.2 dyn/cm, respectively. Average water contact angles of 110 degrees and 106 degrees were measured on the coated glass and acrylic surfaces, respectively. X-ray photoelectron spectroscopy revealed that, after treatment, the fluoroalkyl ligands remained intact on the Si atoms, with a F/C atomic ratio of 2.23.