Determination of processing damage in thin polycrystalline Ir films using Bragg-peak fringe analysis
Determination of processing damage in thin polycrystalline Ir films using Bragg-peak fringe analysis
复制标题
使用布拉格峰条纹分析确定多晶 Ir 薄膜的加工损伤
DOI：
10.1063/1.1346660
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发表时间：
2001
影响因子：
3.2
通讯作者：
I. C. Noyan
中科院分区：
文献类型：
--
作者：
K. Saenger;I. C. Noyan
本文分析了在热氧化硅片上溅射的多晶Ir薄膜(10-20 nm)的Bragg-Brentano衍射谱。我们观察到，沉积后的退火使红外衍射峰变得尖锐，产生了增强的织构，并形成了围绕~(111)Ir反射对称的清晰的厚度条纹。扫描电子显微镜证实，条纹是由退火晶的相干长度增加引起的。随后经过反应离子刻蚀的退火样品显示出不对称的条纹图案，在111Ir峰的高角度侧有较低强度的条纹。对这些样品重新进行热处理，恢复了对称的条纹。在公共领域中使用简单的方程和建模程序对条纹图案进行分析，得到了关于胶片的有价值的结构信息以及由处理引起的变化。这些结果得到了X射线反射率测量和模拟的验证。我们可以..。
We present an analysis of Bragg–Brentano diffraction spectra from blanket thin (10–20 nm) films of polycrystalline Ir, sputter deposited on thermally oxidized Si wafers. We observed that postdeposition annealing sharpened the Ir diffraction peaks, produced enhanced texture, and resulted in the formation of well-defined thickness fringes that were symmetric around the 111 Ir reflection. Scanning electron microscopy confirmed that the fringes were caused by the increased coherence lengths of the annealed grains. Annealed samples subsequently subjected to reactive ion etching exhibited asymmetric fringe patterns, with lower intensity fringes on the high angle side of the 111 Ir peak. Reannealing these samples restored the symmetric fringes. Analysis of the fringe patterns using simple equations and modeling programs in the public domain yielded valuable structural information about the film and the changes caused by processing. These results were verified by x-ray reflectivity measurements and modeling. We c...