Nano-imprinting of surface relief gratings on soda-aluminosilicate and soda-lime silicate glasses
Nano-imprinting of surface relief gratings on soda-aluminosilicate and soda-lime silicate glasses
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DOI：
10.1364/ome.7.001438
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发表时间：
2017-05-01
影响因子：
2.8
通讯作者：
Nishii, Junji
中科院分区：
文献类型：
--
作者：
Kubo, Naoki;Ikutame, Naoki;Nishii, Junji
使用涂铂的SiO2模具施加DC电压，将700 nm周期的一维光栅压印在钠铝硅酸盐玻璃（NAS）和钠钙硅酸盐玻璃（NCS）上。阳极侧表面下方的网络改性剂阳离子向阴极侧的迁移是光栅形成的必要条件。在70 ℃下使用55%KOH溶液化学蚀刻玻璃表面。NAS光栅脊的顶部区域（模具的非接触区域所处的位置）被优先蚀刻。最后通过刻蚀的方法得到了反向凹凸光栅。光栅脊中的局部应力腐蚀预计是各向异性蚀刻和光栅图案形成的起源。相比之下，NCS没有观察到这种异常的蚀刻行为。光栅槽的底部，模具接触区域，被单调地蚀刻，保持初始正弦光栅形状。(C)2017美国光学学会
One-dimensional gratings of 700-nm period were imprinted on a soda-aluminosilicate glass (NAS) and a soda-lime silicate glass (NCS) using a platinum-coated SiO2 mold with application of DC voltage. The migration of network modifier cations below the anode side surface to the cathode side is a necessary condition for grating formation. Glass surfaces were chemically etched using a 55% KOH solution at 70 degrees C. The top area of the NAS grating ridge, where the non-contacted area of the mold is located, was etched preferentially. Finally, the reverse concavo-convex grating appeared by etching. Localized stress corrosion in the grating ridge is expected to be an origin of the anisotropic etching and the grating pattern formation. In contrast, such anomalous etching behavior was not observed for the NCS. The bottom of the grating groove, the mold contacted area, was etched monotonously, maintaining the initial sinusoidal grating shape. (C) 2017 Optical Society of America