Yttria-stabilized zirconia thin film electrolyte deposited by EB-PVD on porous anode support for SOFC applications
Yttria-stabilized zirconia thin film electrolyte deposited by EB-PVD on porous anode support for SOFC applications
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DOI：
10.1016/j.ceramint.2016.11.097
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发表时间：
2017-02
影响因子：
5.2
通讯作者：
Mohammad Tanhaei;M. Mozammel
中科院分区：
文献类型：
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作者：
Mohammad Tanhaei;M. Mozammel
采用电子束物理气相沉积（EB-PVD）技术在1100℃预烧结的NiO-YSZ复合衬底上沉积薄膜（YSZ）电解质，然后在1400℃进一步烧结以获得致密薄膜。利用原子力显微镜（AFM）和FE-SEM对沉积层的表面形貌进行了研究。随着沉积时间和膜厚的增加，膜层的粗糙度和平均粒径增大。新鲜断裂的阳极半电池的FE-SEM观察证实，YSZ电解质层致密、无裂纹、均匀且粘附强烈。通过对NiO-YSZ基板横截面的显微照片研究了NiO和YSZ晶粒的烧结行为。
Electron beam physical vapor deposition (EB-PVD) has been used to deposit thin film (YSZ) electrolytes on NiO-YSZ composite substrates pre-sintered at 1100 °C, followed by further sintering at 1400 °C in order to achieve dense films. Surface morphology of deposited layers has been investigated by AFM and FE-SEM. Increasing the deposition time and YSZ films thickness results in higher roughness and mean particle size of the thin film layer. FE-SEM observations of fresh fractured anodic half cells confirmed dense, crack-free, homogeneous and intensely adhered YSZ electrolyte layers. Sintering behavior of NiO and YSZ grains has been also investigated by the micrographs of cross sections of NiO-YSZ substrates.