Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope
Nanopatterning of alkyl monolayers covalently bound to Si(111) with an atomic force microscope
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DOI：
10.1063/1.1467973
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发表时间：
2002-04-08
影响因子：
4
通讯作者：
Tada, H
中科院分区：
文献类型：
--
作者：
Ara, M;Graaf, H;Tada, H
Alkyl monolayers covalently bound to silicon were prepared through the reaction between 1-alkene molecules and hydrogen-terminated Si. The surfaces were anodized in nanometer scale with a contact-mode atomic force microscope (AFM) by applying positive bias voltage to the surface with respect to a conducting cantilever under ambient conditions. Following the anodization, patterned areas were selectively modified by chemical etching and coating with different molecules. The alkyl monolayers showed high resistance against chemical etching and protected Si surfaces from oxidation. AFM lithography of monolayers on Si was found to be useful for nanofabrication of organic/inorganic interfaces based on the Si-C covalent bond. (C) 2002 American Institute of Physics.
