Modeling of growth kinetics for Pseudomonas spp. during benzene degradation
Modeling of growth kinetics for Pseudomonas spp. during benzene degradation
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DOI：
10.1007/s00253-005-1997-z
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发表时间：
2005-12-01
影响因子：
5
通讯作者：
Lee, CE
中科院分区：
文献类型：
--
作者：
Kim, DJ;Choi, JW;Lee, CE
对3株假单胞菌的生长动力学进行了模拟研究。(铜绿假单胞菌、荧光假单胞菌、恶臭假单胞菌)，以确定最有效的生物降解的最佳底物浓度。对八种不同的初始底物浓度进行了批量测试，以观察使用苯适应细胞的细胞生长和相关底物的降解。由生长曲线得到的比生长速率与底物浓度之间的关系符合抑制模型(Haldane-Andrews，Aiba-Edwards)和非抑制模型(Monod)的动力学参数。结果表明，荧光R菌株的半饱和常数最高，说明该菌株在高浓度下生长良好，而恶臭假单胞菌在低浓度下生长最好。铜绿假单胞菌的抑制常数最大，说明它能耐受高浓度的苯，因此可以在更宽的浓度范围内生长。恶臭杆菌的估计比生长速率较低，但由于本研究使用的高底物浓度范围，半饱和常数高于文献研究的结果。这两个动力学参数导致了Monod-型和Haldane-型模型之间的显著差异，表明在应用这两种模型时应加以区别。
A modeling study was conducted on growth kinetics of three different strains of Pseudomonas spp. (Pseudomonas aeruginosa, Pseudomonas fluorescens, Pseudomonas putida) during benzene degradation to determine optimum substrate concentrations for most efficient biodegradation. Batch tests were performed for eight different initial substrate concentrations to observe cell growth and associated substrate degradation using benzene-adapted cells. Kinetic parameters of both inhibitory (Haldane-Andrews, Aiba-Edwards) and noninhibitory (Monod) models were fitted to the relationship between specific growth rate and substrate concentration obtained from the growth curves. Results showed that half-saturation constant of R fluorescens was the highest among the three strains, indicating that this strain could grow well at high concentration, while P. putida could grow best at low concentration. The inhibition constant of P. aeruginosa was the highest, implying that it could tolerate high benzene concentration and therefore could grow at a wider concentration range. Estimated specific growth rate of R putida was lower, but half-saturation constant was higher than those from literature study due to high substrate concentration range used in this study. These two kinetic parameters resulted in substantial difference between Monod- and Haldane-type models, indicating that distinction should be made in applying those models.