The preparation of SiC ceramic photosensitive slurry for rapid stereolithography
The preparation of SiC ceramic photosensitive slurry for rapid stereolithography
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DOI：
10.1016/j.jeurceramsoc.2021.08.029
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发表时间：
2021-10-04
影响因子：
5.7
通讯作者：
Yang, Yong
中科院分区：
文献类型：
--
作者：
Tang, Jie;Guo, Xiaotian;Yang, Yong
光固化快速成型技术是制备高精度复杂陶瓷零件的最广泛应用的增材制造技术之一。由于SiC粉末的高吸光率和折射率，快速光固化成型SiC陶瓷部件成为一个关键挑战。在这里，我们创新性地使用分级二氧化硅来改善浆料的固化厚度、流变性和沉降性能。提出了一种高固含量、低粘度、低沉降率、高固化厚度的光固化SiC陶瓷浆料的制备方法。该浆料的可印刷精度大于75 μ m，动态粘度小于2Pa·s，24小时沉降高度小于5%。该方法为大尺寸SiC陶瓷绿色坯体的快速光固化成型提供了一种可能性和良好的前景。
Stereolithography is one of the most widely used additive manufacturing techniques for preparing high precision and complex ceramic components. Due to the high optical absorbance and refractive index of SiC powder, the rapid stereolithography of SiC ceramics components has become a key challenge. Here, we innovatively use graded silica to improve the curing thickness, rheological and settling performance of the slurry. And we presented a preparation method of SiC ceramic slurry for stereolithography with high solid content, low viscosity, low sedimentation rate and high curing thickness. The printable precision of the slurry is more than 75 mu m, the dynamic viscosity is less than 2 Pa.s, and the 24 h sedimentation height is less than 5%. This strategy demonstrates a tantalizing possibility and promising prospect to rapid stereolithography of large size SiC ceramic green body.