Nanoscale lithography with frequency-modulation atomic force microscopy.
Nanoscale lithography with frequency-modulation atomic force microscopy.
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DOI：
10.1063/1.3043435
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发表时间：
2008-12
期刊：
影响因子：
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通讯作者：
M. Hamada;T. Eguchi;K. Akiyama;Yukio Hasegawa
中科院分区：
文献类型：
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作者：
M. Hamada;T. Eguchi;K. Akiyama;Yukio Hasegawa
基于调频原子力显微镜(FM-AFM)，发展了一种利用场蒸发重复沉积针尖材料来绘制纳米结构的光刻方法。由于AFM中力传感器石英音叉的高刚度，避免了AFM针尖与基板之间不必要的机械接触。利用FM-AFM对针尖-衬底间隙的精确控制和聚焦离子束锐化的金尖，使我们能够沉积尺寸小至约20 nm的金点，并构建纳米级的图案。
A lithographic method to draw nanoscale structures by repetitive depositions of the tip material by field evaporation has been developed based on frequency-modulation atomic force microscopy (FM-AFM). Because of high stiffness of quartz tuning forks, a force sensor in the AFM, unwanted mechanical contact of the AFM tip with the substrate was prevented. Precise control of the tip-substrate gap distance with FM-AFM and a gold tip sharpened with focused ion beam enable us to deposit gold dots as small as approximately 20 nm in size and construct nanoscale patterns.