Tailorable Fe nanostructures and magnetic anisotropy in (La0.5Sr0.5FeO3)1-x:Fex thin films integrated on SrTiO3 and silicon substrates

Tailorable Fe nanostructures and magnetic anisotropy in (La0.5Sr0.5FeO3)1-x:Fex thin films integrated on SrTiO3 and silicon substrates
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DOI:
10.1016/j.mtadv.2020.100112
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发表时间:
2020-12-01
影响因子:
10
通讯作者:
Wang, H.
Wang, H.
中科院分区:
材料科学2区
文献类型:
--
作者:
Kalaswad, M.;Zhang, B.;Wang, H.

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垂直排列的磁性纳米结构嵌入在氧化物矩阵是一个有吸引力的框架,探索各向异性的性质与潜在的应用,如磁性隧道结的设备。通过在氧化物-金属纳米复合薄膜中生长自组装铁磁纳米结构,可以很容易地调节磁响应。这里,氧化物-金属(La0.5Sr0.5FeO3)(1-x):Fe-x(LSFO 1-x:Fe-x)纳米复合薄膜具有各种摩尔浓度的Fe(x = 0.3,0.4,0.5)通过脉冲激光沉积在还原条件下生长。Fe纳米结构的形貌和磁性进行了研究,以展示可定制的磁各向异性性能。已经发现增加纳米复合材料中Fe的浓度降低Fe纳米结构的纵横比,从而导致较低的磁各向异性。此外,LSFO 0.7:Fe-0.3薄膜成功地集成在硅衬底上,这是实现所提出的器件应用的关键一步。这项研究表明,氧化物-金属LSFO 1-x:Fex纳米复合材料作为一个独特的平台,定制的磁性能和未来的集成磁性纳米结构与可调磁各向异性的设备应用。(C)2020作者由爱思唯尔有限公司发布
Vertically aligned magnetic nanostructures embedded in oxide matrices are an attractive framework for exploring anisotropic properties with potential applications in devices such as magnetic tunnel junctions. Magnetic response can easily be tuned through the growth of self-assembled ferromagnetic nanostructures in oxide-metal nanocomposite thin films. Here, oxide-metal (La0.5Sr0.5FeO3)(1-x):Fe-x (LSFO1-x:Fe-x) nanocomposite thin films with various molar concentrations of Fe (x = 0.3, 0.4, 0.5) are grown by pulsed laser deposition under reducing conditions. The morphology and magnetic properties of Fe nanostructures are investigated to demonstrate tailorable magnetic anisotropic properties. Increasing the concentration of Fe in the nanocomposites has been found to reduce the aspect ratio of Fe nanostructures thus leading to a lower magnetic anisotropy. In addition, LSFO0.7:Fe-0.3 thin films are successfully integrated on silicon substrates, which is a critical step toward realizing the proposed device applications. This study demonstrates oxide-metal LSFO1-x:Fex nanocomposites as a unique platform for tailoring magnetic properties and future integration of magnetic nanostructures with tunable magnetic anisotropy for device applications. (C) 2020 The Authors. Published by Elsevier Ltd.