International Conference on Metallurgical Coatings and Thin Films

International Conference on Metallurgical Coatings and Thin Films
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国际冶金涂层和薄膜会议

DOI:
10.1080/10667857.1993.11784954
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发表时间:
1993
影响因子:
3.1
通讯作者:
A. Agüero
A. Agüero
中科院分区:
材料科学4区
文献类型:
--
作者:
A. Agüero

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贡献者Alina AgUero,博士研究科学家,Cametoid有限公司,惠特比,安大略,加拿大。1992年国际冶金涂层和薄膜会议(ICMCTF)在加州的圣地亚哥举行。这是第一次会议中,真空冶金和薄膜部门的美国真空学会共同努力,扩大范围的传统国际会议冶金涂层。会议包括基础和应用研究主题以及新兴技术的商业应用。一些涂层和薄膜领域的专家介绍了他们的最新成果。由RPH Chang博士(伊利诺伊州埃文斯顿西北大学材料研究中心主任)发表的全体演讲是关于使用碳团簇的金刚石膜成核。演讲首先概述了碳涂层沉积的最新技术水平,最后描述了一种使用C70团簇或”巴基球”作为成核点沉积金刚石的独特方法。团簇通过升华沉积在Si衬底上。金刚石膜的生长使用微波等离子体沉积偏置相对于等离子体的衬底。C70的使用增强成核10倍,与金属和玻璃基板获得类似的结果。图1a和1b所示的解释这些结果的模型是基于c7()分子的独特结构提出的,这使得金刚石的成核和外延成为可能。研究了镍基高温合金上镍铝化物涂层在涂层沉积后热暴露过程中的微观结构稳定性。涂层是通过包埋渗碳沉积的。正如William Gale博士(剑桥大学,剑桥,英国)所解释的,在沉积温度下,来自叶片所填充的粉末混合物的铝扩散到基底(单晶“Y”强化镍基超合金)中,从而产生高活性的铝化镍。结果表明,在850-950 ℃之间,涂层基体中出现了“Y”相的析出。这是由于溶解度变化引起的老化过程,以及在较小程度上由涂层表面的铝损失引起的。在1100摄氏度,
Contributed by Alina AgUero, Ph. D Research Scientist, Cametoid Limited, Whitby, Ontario, Canada. llhe 1992 International Conference on Metallurgi-cal Coatings and Thin Films (ICMCTF) took place in San Diego, California. This was the first conference in which the Vacuum Metallurgy and Thin Films Divisions of the American Vacuum Society joined efforts to broaden the scope of the traditional International Conference on Metallurgical Coatings. The conference incorporated both fundamental and applied research topics as well as commercial applications of the emerging technologies. A number of experts in coating and thin films presented their latest results. The plenary talk delivered by Dr. RPH Chang (Director, Materials Research Center, Northwestern University, Evanston, Illinois) was on the nucleation of diamond films using carbon clusters. The talk opened with an overview of the state of the art in the deposition of carbon coatings and ended with a description of a unique method for depositing diamond by using C70 clusters or" Buckyballs" as nucleation sites. The clusters are deposited on Si substrates via sublimation. The diamond films are grown using microwave plasma deposition by biasing the substrate with respect to the plasma. The use of C70 enhanced nucleation by a factor of 10, with similar results obtained for metal and glass substrates. A model to explain these results, shown in Figure 1a and 1b, was proposed based on the unique structure of the c7 () molecule, which makes possible the nucleation and epitaxy of diamond. An investigation of the microstructural stability of nickel aluminide coatings on a nickel-based superalloy, during thermal exposure after coating deposition, was conducted by edge-on transmission electron microscopy. The coatings were deposited by pack cementation. As explained by Dr. William Gale (University of Cambridge, Cambridge, United Kingdom), at the deposition temperature, aluminum from the powder mixture into which the blades were packed diffuses into the substrate, a single crystal'Y'strengthened nickel-base superalloy, thereby generating a high activity nickel alumnide. The results indicated that between 850-950" C, precipitation of the'Y'phase from the~ phase matrix of the coating occurred. This is attributed to an ageing process caused by solubility modifications and, to a lesser degree, by loss of aluminum from the coating surface. At 1100" C,