Yoshiharu ONUMA,Ryoichi OKADA,Hideki ONO,and Kiichi KAMIMURA: "Preparation of polycrystalline SiC thin films by a reactive sputtering process" Inst.Phys, Conf.Ser.No.137 : Capter 1, Paper presented at the 5th SiC and Related Materials Conf., Washington (I
Yoshiharu ONUMA,Ryoichi OKADA,Hideki ONO,and Kiichi KAMIMURA: "Preparation of polycrystalline SiC thin films by a reactive sputtering process" Inst.Phys, Conf.Ser.No.137 : Capter 1, Paper presented at the 5th SiC and Related Materials Conf., Washington (I
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Yoshiharu ONUMA、Ryoichi OKADA、Hideki ONO 和 Kiichi KAMIMURA：“通过反应溅射工艺制备多晶 SiC 薄膜” Inst.Phys，Conf.Ser.No.137：第 1 章，在第五届 SiC 和相关材料上发表的论文
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