Directed Assembly of a Cylinder-Forming Diblock Copolymer: Topographic and Chemical Patterns
Directed Assembly of a Cylinder-Forming Diblock Copolymer: Topographic and Chemical Patterns
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DOI：
10.1021/ma1006733
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发表时间：
2010-07
期刊：
影响因子：
5.5
通讯作者：
F. Detcheverry;P. Nealey;J. Pablo
中科院分区：
文献类型：
--
作者：
F. Detcheverry;P. Nealey;J. Pablo
使用粗粒模型的模拟，我们检验了地形和化学图案引导共聚物薄膜自组装成无缺陷的垂直圆柱体阵列的能力。地形模式是限制双块的沟槽，而化学模式由优先与少数块相互作用的斑点组成。通过对嵌段共聚物标准模型的蒙特卡罗模拟，描述了嵌段共聚物的自组装过程。虽然完全是三维的，但模拟的系统可以包括100多个域。通过分析薄膜的顶视图和横截面，可以确定各个磁区的有序度和性质。首先，考察了禁闭对有序完备性的影响。通过重点研究沟槽宽度和侧壁选择性的影响，人们可以确定产生具有高可靠性的无缺陷阵列的条件，以及对于哪些磁区表现出高度均匀的跨.
Using simulations of a coarse-grained model, we examine the ability of topographic and chemical patterns to direct the self-assembly of thin films of copolymers into a defect-free array of vertical cylinders. The topographic pattern is a trench where the diblock is confined, whereas the chemical pattern consists of spots that interact preferentially with the minority block. The self-assembly process is described with Monte Carlo simulations of the standard model of block copolymers. While fully three-dimensional, the simulated systems can include over a hundred domains. By analyzing top views and cross sections of thin films, it is possible to determine the degree of ordering and the properties of individual domains. First, the influence of confinement on ordering perfection is examined. By focusing on the influence of trench width and sidewall selectivity, one can identify conditions that yield defect-free arrays with a high reliability and for which domains exhibit a high degree of uniformity across the...