The Structure and Bonding State for Fullerene-Like Carbon Nitride Films with High Hardness Formed by Electron Cyclotron Resonance Plasma Sputtering
The Structure and Bonding State for Fullerene-Like Carbon Nitride Films with High Hardness Formed by Electron Cyclotron Resonance Plasma Sputtering
复制标题
DOI：
10.1143/jjap.51.125602
复制
发表时间：
2012-11
影响因子：
1.5
通讯作者：
Tomoyuki Kamata;O. Niwa;S. Umemura;S. Hirono
中科院分区：
文献类型：
--
作者：
Tomoyuki Kamata;O. Niwa;S. Umemura;S. Hirono
我们利用电子回旋共振溅射技术研究了纯碳薄膜和氮化碳薄膜。该方法的主要特点是在沉积过程中进行高密度离子辐照，这使得纯碳膜具有类富勒烯（FL）结构，而没有氮的掺入。此外，没有衬底加热，ECR溅射CN膜表现出增强的FL微观结构和硬度相媲美的金刚石在中间氮浓度。这种微结构由弯曲和交联的石墨烯片组成，其中分层区域由于增加的sp3键合而显著减少。在高氮浓度条件下，CN膜表现出极低的硬度，因为腈键合不仅减少了共价键合的二维六方网络，但也湮灭了那里的键合。通过透射电子显微镜（TEM）观察到的晶格结构和X射线光电子能谱（XPS）测量的键合状态，对ECR溅射CN薄膜进行了分类，给出了相应的相图和结构区图。
We studied pure carbon films and carbon nitride (CN) films by using electron cyclotron resonance (ECR) sputtering. The main feature of this method is high density ion irradiation during deposition, which enables the pure carbon films to have fullerene-like (FL) structures without nitrogen incorporation. Furthermore, without substrate heating, the ECR sputtered CN films exhibited an enhanced FL microstructure and hardness comparable to that of diamond at intermediate nitrogen concentration. This microstructure consisted of bent and cross-linked graphene sheets where layered areas remarkably decreased due to increased sp3 bonding. Under high nitrogen concentration conditions, the CN films demonstrated extremely low hardness because nitrile bonding not only decreased the covalent-bonded two-dimensional hexagonal network but also annihilated the bonding there. By evaluating lattice images obtained by transmission electron microscopy and the bonding state measured by X-ray photoelectron spectroscopy, we classified the ECR sputtered CN films and offered phase diagram and structure zone diagram.