Recent developments and challenges of nanopositioning and nanomeasuring technology
Recent developments and challenges of nanopositioning and nanomeasuring technology
复制标题
DOI：
10.1088/0957-0233/23/7/074001
复制
发表时间：
2012-07-01
影响因子：
2.4
通讯作者：
Fuessl, Roland
中科院分区：
文献类型：
--
作者：
Manske, Eberhard;Jaeger, Gerd;Fuessl, Roland
随着一些高新技术产业的快速发展，对尺寸微纳米计量的需求显著增加。要测量的结构变得越来越复杂，在越来越大的表面积和可能高度弯曲的表面上，结构宽度越来越小，纵横比越来越高。国际上正在努力开发具有纳米精度的高容量测量机，将测量范围扩大到数百毫米。本文首先概述了目前正在进行的或未来预期的高科技发展所产生的要求，并讨论了纳米定位和纳米测量技术领域的最新发展，包括基本测量方法，激光干涉仪系统。讨论了可用于纳米测量机器的大范围纳米探针系统，如光学聚焦传感器、白光干涉仪显微镜、采用深度聚焦法的CCD相机显微镜、触觉触控探针、原子力显微镜和三维微探针。这些传感器的多功能特性使机器可用于许多不同的计量应用。本文还介绍了一种利用显微镜转轮的多传感器方法。最后，以计量学上具有挑战性的测量为例，例如，扫描弯曲光学表面的微观结构或对具有重要数据量的非常大的区域进行AFM扫描。
Rapid progress in several high-tech industries has significantly increased the need for dimensional micro- and nano-metrology. Structures to be measured are becoming more complex with smaller structure widths and higher aspect ratios in increasingly larger surface regions and potentially highly curved surfaces. Significant international effort can be seen to develop high-capacity measuring machines with nanometre precision in growing measuring ranges up to hundreds of millimetres. This paper begins with an outline of the requirements stemming from high-tech developments currently being done or expected in the future and discusses recent developments in the field of nanopositioning and nanomeasuring technology with respect to basic measurement approaches, laser interferometer systems. The large range of nanoprobe systems usable in nanomeasuring machines is discussed, such as optical focus sensors, white light interferometer microscopes, CCD camera microscopes using the depth from the focus method, tactile stylus probes, atomic force microscopes (AFMs) and 3D microprobes. The versatile properties of these sensors allow the machine to be used in many different metrological applications. The paper also introduces a multi-sensor approach using a microscope revolver. It concludes with an illustration of metrologically challenging measurements, e. g., scanning micro- structures of curved optical surfaces or performing AFM scans of very large regions with significant data volume.