Ultraviolet penetration depth of phosphor Pr-doped Ca0.6Sr0.4TiO3 epitaxial film
Ultraviolet penetration depth of phosphor Pr-doped Ca0.6Sr0.4TiO3 epitaxial film
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荧光粉掺Pr0.6Sr0.4TiO3外延膜的紫外穿透深度
DOI：
10.1016/j.ceramint.2019.06.291
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发表时间：
2019
影响因子：
5.2
通讯作者：
Takashima Hiroshi
中科院分区：
文献类型：
--
作者：
Oshime Norihiro;Shimizu Yuhei;Takashima Hiroshi
研究了Pr掺杂Ca0.6Sr0.4TiO3外延薄膜的紫外光穿透深度。在SrTiO 3（001）单晶衬底上生长了Pr掺杂的Ca 0. 6Sr 0. 4 TiO 3薄膜，薄膜厚度分别为50、100、200、500和1000 nm。穿透深度估计从膜的厚度依赖的光致发光强度和分析，通过使用指数Box-Lucas方程。结果表明，Pr掺杂的Ca0.6Sr0.4TiO3薄膜在厚度大于200 nm时达到最大发光强度。高透明的氧化物-磷光体膜和简单的分析相结合，使得穿透深度的精确测量成为可能。这种方法可以适用于其他磷光体陶瓷。我们的方法和结果对信息设备和安全印刷的基础技术有很大的帮助，也实现了显着的稀土离子的资源节约。
We elucidated the penetration depth of the ultraviolet excitation light for oxide-phosphor: Pr-doped Ca0.6Sr0.4TiO3epitaxial film. Pr-doped Ca0.6Sr0.4TiO3films with thicknesses of 50, 100, 200, 500, and 1000 nm were grown on single-crystal SrTiO3(001) substrates. The penetration depth was estimated from the film-thickness dependence of photoluminescence intensities and analyzed by using the exponential Box-Lucas equation. It was found that Pr-doped Ca0.6Sr0.4TiO3achieves nearly maximal intensity when the thickness is above approximately 200 nm. The combination of highly transparent oxide-phosphor films and the simple analysis make the precise measurement of penetration depth possible. This approach could be applicable to other phosphor ceramics. Our methods and results are quite helpful in the fundamental technologies for information devices and security printings, and also realizes significant resource savings of rare-earth ions.