X-ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems
X-ray photoelectron spectroscopic chemical state quantification of mixed nickel metal, oxide and hydroxide systems
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DOI：
10.1002/sia.3026
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发表时间：
2009-04-01
影响因子：
1.7
通讯作者：
Smart, Roger St. C.
中科院分区：
文献类型：
--
作者：
Biesinger, Mark C.;Payne, Brad P.;Smart, Roger St. C.
混合镍金属，氧化物，氢氧化物和羟基氧化物系统的定量化学状态的X射线光电子能谱分析是具有挑战性的，由于多重态分裂，震荡和等离子体损失结构所产生的Ni 2 p峰形状的复杂性。混合镍化学状态的定量和低浓度的Ni（III）物种的定性测定证明通过基于标准光谱的方法从质量参考样品（Ni，NiO，Ni（OH）（2），NiOOH），这些光谱的减法，和数据分析，整合信息从Ni 2 p光谱和0 - 1 s光谱。商业镍粉和薄的氧化镍膜生长在1托O-2和300摄氏度为20分钟的定量证明。不确定的相对灵敏度因子（如镍2.67 +/- 0.54）的影响进行了讨论，是薄膜分析的基础上计算的非弹性平均自由程的测量深度。版权所有（C）2009约翰威利父子有限公司
Quantitative chemical state X-ray photoelectron spectroscopic analysis of mixed nickel metal, oxide, hydroxide and oxyhydroxide systems is challenging due to the complexity of the Ni 2p peak shapes resulting from multiplet splitting, shake-up and plasmon loss structures. Quantification of mixed nickel chemical states and the qualitative determination of low concentrations of Ni(III) species are demonstrated via an approach based on standard spectra from quality reference samples (Ni, NiO, Ni(OH)(2), NiOOH), subtraction of these spectra, and data analysis that integrates information from the Ni 2p spectrum and the 0 1s spectra. Quantification of a commercial nickel powder and a thin nickel oxide film grown at 1 -Torr O-2 and 300 degrees C for 20 min is demonstrated. The effect of uncertain relative sensitivity factors (e.g. Ni 2.67 +/- 0.54) is discussed, as is the depth of measurement for thin film analysis based on calculated inelastic mean free paths. Copyright (C) 2009 John Wiley & Sons, Ltd.