Purity of targets prepared on Cu substrates
Purity of targets prepared on Cu substrates
复制标题
在铜基板上制备的靶材的纯度
DOI：
10.1016/0168-9002(93)90552-s
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发表时间：
1993
影响因子：
1.4
通讯作者：
J. Sens
中科院分区：
文献类型：
--
作者：
A. Méens;I. Rossini;J. Sens
研究了通常通过蒸发到可溶性铜基底上制备的几种元素自支撑靶材的纯度。通过卢瑟福背散射和仪器中子活化分析对目标进行分析。由于在一些硅靶中观察到高比例的铜，因此对通过电子枪轰击铜和离子束溅射到甜菜碱上沉积的硅靶进行了进一步的测量，包括透射电子显微镜。
The purity of several elemental self-supporting targets usually prepared by evaporation onto soluble Cu substrates has been studied. The targets were analysed by Rutherford backscattering and instrumental neutron activation analysis. Because of the high percentage of Cu observed in some Si targets, further measurements, including transmission electron microscopy, have been performed on Si targets deposited by e-gun bombardment onto Cu and ion-beam sputtering onto betaine.