Dynamics during holographic exposure in photopolymers for single and multiplexed gratings

Dynamics during holographic exposure in photopolymers for single and multiplexed gratings
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单路和多路光栅光聚合物全息曝光期间的动力学

DOI:
10.1080/09500349908231394
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发表时间:
1999
影响因子:
1.3
通讯作者:
B. K. Jenkins
B. K. Jenkins
中科院分区:
物理与天体物理4区
文献类型:
--
作者:
S. Piazzolla;B. K. Jenkins

文献摘要

被引文献

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假设在低记录强度下,光栅形成过程比自由单体扩散慢得多,我们提出了一个模型来描述光聚合物中全息光栅形成的动力学。该模型表明光束强度调制如何影响光栅调制的饱和值,而平均记录强度以非线性方式与处理时间常数相关。该模型的扩展描述并预测了在存在额外的相互不相干光束的情况下单个光栅的记录,以及角度复用光栅的同时记录。通过与使用杜邦 HRF-150-38 光聚合物获得的实验结果进行比较,验证了该模型。
Under the assumption that at low recording intensity the grating formation process is much slower than the free monomer diffusion, we present a model that describes the dynamics of the holographic grating formation in photopolymers. The model indicates how the beam intensity modulation influences the saturation value of the grating modulation, while the average recording intensity is related in a nonlinear fashion to the process time constant. An extension of this model describes and predicts the recording of a single grating in the presence of an additional mutually incoherent light beam, and the simultaneous recording of angularly mutliplexed gratings. The model is validated by comparing with experimental results obtained using DuPont HRF-150-38 photopolymer.