Radio‐frequency plugging of a high density plasma
Radio‐frequency plugging of a high density plasma
复制标题
高密度等离子体的射频堵塞
DOI：
10.1063/1.862153
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发表时间：
1978
影响因子：
4.6
通讯作者：
K. Takayama
中科院分区：
文献类型：
--
作者：
T. Watari;T. Hatori;R. Kumazawa;S. Hidekuma;T. Aoki;T. Kawamoto;M. Inutake;S. Hiroe;A. Nishizawa;K. Adati;Teruyuki Sato;Tsuguhiro Watanabe;H. Obayashi;K. Takayama
通过低阻抗线圈在镜喉处施加射频场可以抑制镜端损耗。该方法被证明是有效的高密度等离子体高达1014 cm−3。实验结果表明，封堵所需的射频场强度与等离子体密度有关。依赖关系根据线圈的几何形状而不同。从理论上阐明了每个线圈的密度依赖的机理。特别地，研究表明，在静态磁场方向上产生的电场对于ⅲ型线圈的结果是固有的，其射频堵塞效率对等离子体密度不敏感。
Mirror end loss can be suppressed by applying an rf field at the mirror throat through low impedance coils. This method is verified to be effective for a high density plasma up to 1014 cm−3. Experimental results show that the rf field strength required for the plugging is dependent on the plasma density. The dependence differs according to the geometry of the coil. The mechanism of giving the density dependence is theoretically clarified for each coil. Particularly, it is shown that the electric field induced in the direction of the static magnetic field is intrinsic for the result of type‐III coil where its efficiency for rf plugging is insensitive to the plasma density.