Double-textured ZnO:Al films obtained by a one-step etching method for enhanced light trapping

Double-textured ZnO:Al films obtained by a one-step etching method for enhanced light trapping
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一步蚀刻法获得双织构 ZnO:Al 薄膜以增强光捕获

DOI：
10.1007/s10854-016-5953-8
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发表时间：
2017-02
期刊：
Journal of Materials Science: Materials in Electronics
影响因子：
--
通讯作者：
Weiping Chai
Weiping Chai
中科院分区：
其他
文献类型：
--
作者：
Ying Wang;Weiwei Jiang;Wanyu Ding;Weiping Chai

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采用沉积、刻蚀和二次沉积相结合的方法制备了具有良好光电性能和增强捕光能力的双织构ZnO：Al(AZO)透明导电膜，整个过程只采用一步刻蚀工艺。系统地研究了一步腐蚀方法对双织构AZO薄膜的结构、光电性能、表面形貌和捕光能力的影响。经二次沉积后，双层织构薄膜表面覆盖有均匀明显的凹坑状织构结构。与单织构AZO薄膜相比，双织构AZO薄膜具有更高的雾度。采用一步腐蚀法制备了双层织构的AZO薄膜，获得了有效的光捕获增强效果。
Double-textured ZnO:Al (AZO) transparent conducting films with good optoelectronic characteristics and enhanced light trapping ability were prepared by a method including deposition, etching and re-deposition, and only one-step etching process was adopted during the whole process. The effects of the one-step etching method on the structural and optoelectronic properties, surface morphology and light trapping ability of double-textured AZO films were studied systematically. Double-textured films were covered with uniformly and distinctly crater-like textured structure after the re-deposition. And double-textured AZO films exhibited higher haze values compared with the single-textured films. Effective enhancement of light trapping was obtained from the double-textured AZO films by the one-step etching method.
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