Tuning of Resistance of Nanogaps Using Field-Emission-Induced Electromigration with Feedback Control Scheme
Tuning of Resistance of Nanogaps Using Field-Emission-Induced Electromigration with Feedback Control Scheme
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使用场发射感应电迁移和反馈控制方案调节纳米间隙的电阻
DOI:
10.1109/nano.2013.6721060
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发表时间:
2013
期刊:
影响因子:
--
通讯作者:
R. Suda and J. Shirakashi
中科院分区:
文献类型:
--
作者:
M. Ando;S. Akimoto;R. Suda and J. Shirakashi
We report a newly investigated technique for the tuning of tunnel resistance of nanogaps using electromigration phenomena induced by a field emission current, which is called “activation” method. First, Planar-type initial nanogaps of Ni separated by 20-50 nm were defined on SiO2/Si substrates. Then, a bias current was applied to the initial Ni nanogaps at room temperature using a current source. Here, we propose a feedback approach during activation procedures, in order to precisely control the resistance of nanogaps at room temperature. We call this method “feedback-controlled activation (FCA)”, and it is revealed that control characteristics of tunnel resistance of nanogaps are successfully improved using FCA procedure, as compared with conventional activation without feedback scheme. These results indicate that a feedback approach is useful for the stable control of tunnel resistance of nanogaps using activation method.