Roles of interface roughness and internal stress in magnetic anisotropy of CoPt/AlN multilayer films
Roles of interface roughness and internal stress in magnetic anisotropy of CoPt/AlN multilayer films
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DOI:
10.1016/j.actamat.2012.08.053
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发表时间:
2012-11
期刊:
影响因子:
9.4
通讯作者:
Youxing Yu;Ji Shi;Yoshio Nakamura
中科院分区:
文献类型:
--
作者:
Youxing Yu;Ji Shi;Yoshio Nakamura
Magnetic anisotropy of CoPt/AlN multilayer films has been studied by systematically varying the nominal thickness of CoPt layers, tCoPt(1–10nm), and the annealing temperature, Ta(300–500°C). The as-deposited films show in-plane magnetic anisotropy in the full range of tCoPt, whereas the annealed films show perpendicular magnetic anisotropy (PMA) within small tCoPtbut change to in-plane magnetic anisotropy when tCoPtis over a certain thickness. The critical thickness for such anisotropic transformations increases as the Taincreases. The maximum PMA obtained in this work is 1.13×107ergcm−3. The interface roughness was analyzed by cross-sectional high-resolution electron microscopy and X-ray reflectivity using an abrupt interface model with a Debye exponent shape. The internal stress was analyzed by X-ray diffraction using an equal biaxial stress model. The results show that the CoPt/AlN interface roughness decreases from 0.385nm to 0.158nm and the internal stress increases from −2.36GPa (compressive) to 1.73GPa (tensile), as the Taincreases to 500°C. The roles of the interface roughness and the internal stress in the magnetic anisotropy of CoPt/AlN multilayer films are studied.