Practical notes on ultraviolet technical photography for art examination
Practical notes on ultraviolet technical photography for art examination
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DOI：
10.14568/cp2015006
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发表时间：
2015-06-01
影响因子：
0.3
通讯作者：
Cosentino, Antonino
中科院分区：
文献类型：
--
作者：
Cosentino, Antonino
本文讨论了两种基于紫外光源的艺术品检测技术摄影方法：紫外荧光法（UVF）和紫外反射法（UVR）。虽然UVF技术可以用任何数码相机进行，但UVR图像是用修改为全光谱的数码相机获取的，因此对光谱的UV区域敏感，直到约360 nm。这一改进涉及去除CCD或CMOS传感器上的内置热镜滤波器，使其对紫外线和红外线辐射敏感。本文阐述了这些技术摄影方法所需的程序和设备，讨论了案例研究和准备样品的结果。
This paper discusses two technical photographic methods based on the use of ultraviolet sources for art examination: ultraviolet fluorescence (UVF) and ultraviolet reflectance (UVR). While the UVF technique can be carried out with any digital camera, UVR images are acquired with a digital camera modified to be full spectrum, and thus sensitive into the UV region of the spectrum until about 360 nm. This modification involves the removal of the in-built hot mirror filter on the CCD or CMOS sensor, rendering it sensitive to ultraviolet and infrared radiation. This paper illustrates the procedures and the equipment needed for these technical photographic methods, discussing case studies and results on prepared samples.