Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
Mechanical properties of boron nitride films prepared by plasma-enhanced chemical vapor deposition
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DOI：
10.1016/j.surfcoat.2005.01.032
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发表时间：
2005-10
影响因子：
5.4
通讯作者：
Hangsheng Yang;T. Yoshida
中科院分区：
文献类型：
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作者：
Hangsheng Yang;T. Yoshida
采用电感耦合等离子体增强化学气相沉积技术制备了层状结构的立方氮化硼薄膜和c轴平行于衬底表面的涡轮层状氮化硼薄膜。纳米压痕测试表明，立方氮化硼薄膜的硬度和弹性模量随着立方相含量的增加而增加，当立方相含量为96%时，其硬度和弹性模量分别接近50和250 GPa.而涡轮层状氮化硼薄膜的硬度和弹性模量分别与载荷和加载速率有关，分别低至1.5和30 GPa.此外，证实了涡轮层状氮化硼在压痕后的滞后恢复，并发现在压痕过程中大约50%的能量在1分钟内释放。
Two kinds of boron nitride thin films, cubic boron nitride film with a layered structure, and turbostratic boron nitride film with a c-axis parallel to the substrate surface, were prepared by inductively coupled plasma-enhanced chemical vapor deposition. Nanoindentation tests revealed that the hardness and elastic modulus of cubic boron nitride films increased with cubic phase content and approached approximately 50 and 250 GPa, respectively, for the case of 96% cubic phase, while those of turbostratic boron nitride films were load and loading rate dependent and as low as 1.5 and 30 GPa, respectively. Moreover, the hysteretic recovery of turbostratic boron nitride after indentation was confirmed, and approximately 50% of the energy dissipated during indentation was found to be released within 1 min.