Figuring of an ultra-smooth surface in nanoparticle colloid jet machining
Figuring of an ultra-smooth surface in nanoparticle colloid jet machining
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DOI：
10.1088/0960-1317/19/5/054009
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发表时间：
2009-05-01
影响因子：
2.3
通讯作者：
Luan, Dianrong
中科院分区：
文献类型：
--
作者：
Zhang, Feihu;Song, Xiaozong;Luan, Dianrong
胶体系统中羟基自由基和纳米颗粒的表面影响相互作用，涉及化学吸附反应，破坏结构键并改变表面化学和结构，为生产超光滑表面提供了有前景的应用。开发了一种纳米颗粒胶体喷射加工系统，利用可逆聚合和分解反应去除表面原子。采用漫反射傅里叶变换红外光谱仪测量抛光前后的纳米颗粒，并分析红外波段。该研究从分子水平上揭示了SiO2纳米粒子胶体与K9玻璃之间界面反应的机理和本质，为现代光学加工中利用纳米粒子胶体射流加工实现超光滑表面提供了理论基础。我们使用该系统对 K9 基板进行抛光；最近的一些实验证明，采用适当的工艺参数，可以达到每分钟 1 nm 水平的玻璃表面去除率。纳米颗粒胶体射流加工的工作表面微观粗糙度在1 nm rms以下。
The surface impact interactions of hydroxy radicals and nanoparticles in a colloid system, involving chemisorption reactions which break structural bonds and alter the surface chemistry and structure, offer promising applications for producing an ultra-smooth surface. A nanoparticle colloid jet machining system has been developed in which the reversible polymerization and decomposition reaction is utilized to remove surface atoms. The nanoparticles before and after polishing were measured by using diffuse reflectance Fourier-transform infrared spectroscopy, and the infrared bands were analyzed. The study revealed the mechanism and essence of the interface reaction between the SiO2 nanoparticle colloid and K9 glass on the molecular level, and could provide the theoretical basis for the usage of nanoparticle colloid jet machining for figuring of an ultra-smooth surface in modern optical machining. We employed the system to polish a K9 substrate; some recent experiments prove that it is possible to obtain removal rates of the 1 nm level per minute for glass surfaces with appropriate process parameters. The microroughness of the work surface processed by nanoparticle colloid jet machining is under 1 nm rms.