Few-layer graphene under high pressure: Raman and X-ray diffraction studies
Few-layer graphene under high pressure: Raman and X-ray diffraction studies
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DOI：
10.1016/j.ssc.2012.10.002
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发表时间：
2013-01-01
影响因子：
2.1
通讯作者：
Yoo, Choong-Shik
中科院分区：
文献类型：
--
作者：
Clark, S. M.;Jeon, Ki-Joon;Yoo, Choong-Shik
利用X射线衍射和拉曼光谱研究了在准流体静力学和非流体静力学条件下压力对少层石墨烯结构的影响。结果表明，少层石墨烯在接近2.8埃的临界层间距离（或高于接近18 GPa的临界层间距离）处失去其长程有序性，同时保持层中的局部sp（2）杂化至50 GPa。这表明石墨烯不仅具有所有石墨层结构中最高的稳定性，而且在大应力下也成为最可愈合的结构之一。(C)2012爱思唯尔有限公司出版
The effect of pressure on the structure of few-layer graphene has been investigated to 50 GPa in both quasi-hydrostatic and non-hydrostatic conditions, using X-ray diffraction and Raman spectroscopy. The results indicate that few-layer graphene loses its long-range order at the critical interlayer distance of similar to 2.8 angstrom (or above similar to 18 GPa), while maintaining the local sp(2) hybridization in the layer to 50 GPa. This suggests that graphene not only has the highest stability of all graphitic layer structures, but also becomes one of the most healable structures under large stress. (C) 2012 Published by Elsevier Ltd.