Evolution and applications of polymer brush hypersurface photolithography

Evolution and applications of polymer brush hypersurface photolithography
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DOI:
10.1039/d1py01073e
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发表时间:
2021-09
期刊:
影响因子:
4.6
通讯作者:
Daniel J. Valles;Yerzhan S. Zholdassov;Adam B. Braunschweig
Daniel J. Valles;Yerzhan S. Zholdassov;Adam B. Braunschweig
中科院分区:
化学2区
文献类型:
--
作者:
Daniel J. Valles;Yerzhan S. Zholdassov;Adam B. Braunschweig

文献摘要

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超表面光刻产生任意聚合物刷图案,其对特征直径、高度和特征之间的间距具有独立控制,同时控制沿沿着聚合物链和特征之间的组成。
Hypersurface photolithography creates arbitrary polymer brush patterns with independent control over feature diameter, height, and spacing between features, while controlling composition along a polymer chain and between features.