Effects of reactor pressure on GaN nucleation layers and subsequent GaN epilayers grown on sapphire substrate

Effects of reactor pressure on GaN nucleation layers and subsequent GaN epilayers grown on sapphire substrate
复制标题

DOI:
10.1016/s0022-0248(03)01235-1
复制
发表时间:
2003-07
影响因子:
1.8
通讯作者:
Jie Chen;S. Zhang;Bingxing Zhang;Juntao Zhu;G. Feng;X. Shen;Y. Wang;H. Yang;W. Zheng
Jie Chen;S. Zhang;Bingxing Zhang;Juntao Zhu;G. Feng;X. Shen;Y. Wang;H. Yang;W. Zheng
中科院分区:
材料科学3区
文献类型:
--
作者:
Jie Chen;S. Zhang;Bingxing Zhang;Juntao Zhu;G. Feng;X. Shen;Y. Wang;H. Yang;W. Zheng

文献摘要

被引文献

相似文献