Pulse electrodeposition of titanium on carbon steel in the LiF-NaF-KF eutectic melt
Pulse electrodeposition of titanium on carbon steel in the LiF-NaF-KF eutectic melt
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DOI：
10.1023/a:1003994100902
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发表时间：
2000-02-01
影响因子：
2.9
通讯作者：
Ribeiro, RB
中科院分区：
文献类型：
--
作者：
Robin, A;Ribeiro, RB
使用直接 (DC) 和单极脉冲电流 (PC) 技术在 K3TiF6-LiF-NaF-KF 熔体中进行钛的电沉积。 PC 电镀在 750 摄氏度下获得致密且光滑的钛涂层，而 DC 电镀则导致粗糙和树枝状沉积物。使用100 μC cm(-2)脉冲充电和50和75 mA cm(-2)阴极电流密度获得了最佳结果。阴极电流效率在60-65%范围内。在这种条件下获得的钛沉积物在室温下的 NaCl 和 HNO3 溶液中的表现与 CP-钛相似。
Electrodeposition of titanium was carried out in the K3TiF6-LiF-NaF-KF melt using both direct (DC) and unipolar pulse current (PC) techniques. Dense and smooth titanium coatings were obtained by PC plating at 750 degrees C whereas DC plating led to rough and dendritic deposits. The best results were obtained using a 100 mu C cm(-2) pulse charge and a cathodic current density of 50 and 75 mA cm(-2). The cathodic current efficiency was in the range 60-65%. The titanium deposits obtained under such conditions behaved similarly to CP-titanium in NaCl and HNO3 solutions at room temperature.