Hardness and structure of a-CNx films synthesized by chemical vapor deposition
Hardness and structure of a-CNx films synthesized by chemical vapor deposition
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DOI：
10.1143/jjap.39.4148
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发表时间：
2000-07-01
期刊：
影响因子：
--
通讯作者：
Saitoh, H
中科院分区：
文献类型：
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作者：
Tanaka, D;Ohkawara, Y;Saitoh, H
利用BrCN与Ar亚稳原子的离解激发反应，采用离子轰击和化学气相沉积相结合的方法合成了机械硬度较高的a-CNx薄膜。纳米压痕试验表明，压痕硬度、杨氏模量和弹性回复率随着离子加速电压的增加而增加。此外，在离子轰击的样品中，团簇之间的流动程度降低。红外吸收光谱上的D（无序）带吸收被归属于芳族叔胺的C-N吸收所取代。这些结果表明，氮化碳团簇的内部和外部结构从二维C-N有序结构转变为三维C-N有序结构。硬a-CNx的结构与含氮类金刚石碳明显不同。
Mechanically hard a-CNx films were synthesized using a combination of ion bombardment and the chemical vapor deposition process using the dissociative excitation reaction of BrCN with Ar metastable atoms. Nanoindentation tests disclosed that the indentation hardness, Young's modulus and elastic recovery increased with increasing ion-accelerating voltage. Moreover, the degree of flow among clusters decreased in the ion-bombarded sample. The D (disordered)-band absorption on an infrared absorption spectrum was replaced by a C-N absorption assigned to the tertiary aromatic amine. These results suggest that the internal and external structures of the carbon nitride cluster change from the two-dimensional order to the three-dimensional order of C-N. The structure of hard a-CNx is clearly distinguishable from nitrogen-containing diamond-like carbon.