Theoretical and experimental investigation of chemical vapor deposition of yttrium silicate
Theoretical and experimental investigation of chemical vapor deposition of yttrium silicate
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硅酸钇化学气相沉积的理论与实验研究
DOI：
10.1016/j.ceramint.2020.07.291
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发表时间：
2020-08
影响因子：
5.2
通讯作者：
Zhang Chengyu
中科院分区：
文献类型：
--
作者：
He Fang;Liu Yongsheng;Gao Yuqing;Wang Jing;Zhang Chengyu
Based on the minimum Gibbs free energy principle, thermodynamic calculations of the Y2O3–CH3SiCl3–CO2–H2-Ar system are carried out using FactSage software. Moreover, the influences of deposition temperature, total pressure, the H2dilution ratio, and the molar ratio of reactants on thermodynamic phase diagrams and product yield diagrams of the Y2O3–CH3SiCl3–CO2–H2-Ar system have been systematically investigated. Subsequently, based on the calculation results, the X1-Y2SiO5and β-Y2Si2O7phases are successfully deposited at a lower deposition temperature of 1100 °C, system pressure of 2 kPa, CH3SiCl3flow rate of 39 mL/min, H2dilution ratio of 9, andn(CO2)/n(H2) ratio of 3:10. In addition, NMR results revealed the molecular structure of the as-deposited yttrium silicate coating, and scanning electron microscopy, which was used for morphological analysis, confirmed the dispersion of yttrium silicate particles in the SiC layer.
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DOI：
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影响因子：
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