Photon force analysis for a spherical particle near a substrate illuminated by a tightly focused laser beam
Photon force analysis for a spherical particle near a substrate illuminated by a tightly focused laser beam
复制标题
对紧密聚焦激光束照射的基底附近的球形粒子进行光子力分析
DOI：
10.1063/1.1593806
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发表时间：
2003
影响因子：
3.2
通讯作者：
Y. Kawata
中科院分区：
文献类型：
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作者：
W. Inami;Y. Kawata
我们对作用在紧密聚焦激光束照射的基底附近的球形粒子上的辐射力进行了分析。由于颗粒和基底之间的多重散射，颗粒可能被捕获在多个位置。当两者非常接近时，粒子被吸引到基底上，因为多重散射会在基底表面上产生高强度区域。在许多情况下，我们发现为了扫描基底表面上的粒子，需要精确控制焦点位置。根据我们的分析结果，我们还比较了有基底和没有基底的粒子上的辐射力的势能。
We present an analysis of the radiation force acting on a spherical particle near a substrate that is illuminated by a tightly focused laser beam. The particle may be trapped at multiple positions due to multiscattering between the particle and the substrate. The particle is attracted to the substrate when the two are very close to each other, because the multiscattering produces a high-intensity region on the substrate surface. In many instances we found that a precise control of the focal position was necessary in order to scan the particle on the substrate surface. On the basis of the results of our analysis, we also compare the potentials of radiation forces on the particle with and without a substrate.
W.Inami：“分析基板附近的粒子对紧密聚焦激光束的散射光分布”J.Appl.Phys..（正在出版）。
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