A Temporary Barrier Effect of the Alloy Layer During Selenization: Tailoring the Thickness of MoSe2 for Efficient Cu2ZnSnSe4 Solar Cells
A Temporary Barrier Effect of the Alloy Layer During Selenization: Tailoring the Thickness of MoSe2 for Efficient Cu2ZnSnSe4 Solar Cells
复制标题
硒化过程中合金层的临时势垒效应:为高效 Cu2ZnSnSe4 太阳能电池定制 MoSe2 的厚度
DOI:
10.1002/aenm.201402178
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发表时间:
2015-05-06
影响因子:
27.8
通讯作者:
Sun, Yun
中科院分区:
文献类型:
--
作者:
Li, Jianjun;Zhang, Yi;Sun, Yun
The influence of a prealloying process on the formation of MoSe2 and thus on the performance of Cu2ZnSnSe4 (CZTSe) solar cells is investigated using sputtering deposition and post-annealing approaches. The dense alloy layer, which is made by a low-temperature prealloying process, acts as a temporary Se diffusion barrier during a subsequent high-temperature selenization process. The formation of thick interfacial MoSe2 can be suppressed effectively by this temporary barrier, cooperating with subsequent quick formation of compact CZTSe layer. The thickness of interfacial MoSe2 layer in CZTSe solar cells can be tailored by adjusting the preannealing process during selenization. As a consequence, the series resistance of CZTSe solar cells is reduced to a low level (similar to 0.6 Omega cm(2)), and the performance of CZTSe solar cells is improved significantly. A CZTSe solar cell with efficiency of 8.7% is fabricated.