Dense and smooth amorphous films of multicomponent FeCoNiCuVZrAl high-entropy alloy deposited by direct current magnetron sputtering
Dense and smooth amorphous films of multicomponent FeCoNiCuVZrAl high-entropy alloy deposited by direct current magnetron sputtering
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DOI：
10.1016/j.matdes.2012.11.001
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发表时间：
2013-04-01
影响因子：
8.4
通讯作者：
Jiang, Q.
中科院分区：
文献类型：
--
作者：
Liu, L.;Zhu, J. B.;Jiang, Q.
在Ar和N-2混合气氛中，用直流磁控溅射方法制备了FeCoNiCuVZrAl高熵合金的多元非晶氮化物薄膜。系统的研究表明，非晶薄膜的化学成分、微观结构和力学性能与混合气氛中N-2的浓度密切相关。当N-2流量比从0%增加到50%时，膜层厚度减小，而粗糙度先减小后增大。当N-2流量比为30%时，可以得到致密、光滑的非晶态氮化物薄膜。薄膜的硬度和杨氏模数分别达到最大值12和166 GPa.(C)2012爱思唯尔有限公司。保留所有权利。
The multicomponent amorphous nitride films of FeCoNiCuVZrAl high-entropy alloy were deposited by direct current magnetron sputtering in the mixture atmosphere of Ar and N-2. The systematical investigations demonstrate that the chemical composition, microstructure, and mechanical properties of the amorphous films intimately rely on the concentration of N-2 in the atmosphere mixture. When N-2 flow ratio increases from 0% to 50%, the thickness of the films decreases, whereas the roughness firstly decreases and then increases. At the N-2 flow ratio of 30%, a perfect dense and smooth amorphous nitride film could be achieved. While the hardness and Young's modulus of the film reach the maximum values of 12 and 166 GPa, respectively. (C) 2012 Elsevier Ltd. All rights reserved.