Soft anisotropic Fe/sub 65/Co/sub 35//Co thin films prepared by facing targets sputtering
Soft anisotropic Fe/sub 65/Co/sub 35//Co thin films prepared by facing targets sputtering
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DOI：
10.1109/tmag.2005.855307
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发表时间：
2005-10
影响因子：
2.1
通讯作者：
Yu Fu;T. Miyao;T. Yamakami;Zheng Yang;M. Matsumoto;Xiaoxi Liu;A. Morisako
中科院分区：
文献类型：
--
作者：
Yu Fu;T. Miyao;T. Yamakami;Zheng Yang;M. Matsumoto;Xiaoxi Liu;A. Morisako
采用面向目标溅射（FTS）法制备了4/spl pi/M/sub s/约24 kG的高饱和磁化FeCo(Fe/sub 65/Co/sub 35/)/Co薄膜。通过插入薄钴衬底，获得了良好的平面内单轴各向异性和优异的软磁性能，硬轴矫顽力为H/sub /=3 Oe。x射线衍射（XRD）结果表明，Co下层将FeCo单层中的主衍射线[200]改变为FeCo/Co膜中的主衍射线[110]。Co下层显著降低了FeCo单层膜的平均晶粒尺寸，从/spl sim/74 nm降至/spl sim/8.2 nm。FeCo/Co薄膜表面更光滑，晶粒尺寸分布更窄。
High saturation magnetization FeCo(Fe/sub 65/Co/sub 35/)/Co films with 4/spl pi/M/sub s/ about 24 kG were prepared by facing targets sputtering (FTS). A well-defined in-plane uniaxial anisotropy and excellent soft magnetic properties were obtained with a hard axis coercivity of H/sub ch/=3 Oe by inserting a thin Co underlayer. The X-ray diffractometry (XRD) results indicate that the Co underlayer changed the main diffraction line from [200] in the FeCo single layer to [110] in the FeCo/Co films. The Co underlayer significantly reduced the average grain size from /spl sim/74 nm for FeCo single layer to /spl sim/8.2 nm for FeCo/Co films. A smoother surface and a narrower grain size distribution were observed in FeCo/Co films.