Preparation of epoxy/silica and epoxy/titania hybrid resists via a sol-gel process for nanoimprint lithography
Preparation of epoxy/silica and epoxy/titania hybrid resists via a sol-gel process for nanoimprint lithography
复制标题
通过溶胶-凝胶工艺制备环氧树脂/二氧化硅和环氧树脂/二氧化钛混合抗蚀剂用于纳米压印光刻
DOI:
10.1021/jp908141f
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发表时间:
2010
影响因子:
3.7
通讯作者:
S. Hsu
中科院分区:
文献类型:
--
作者:
Chun;S. Hsu
In this study, the solvent-free thermocurable epoxy/inorganic hybrid resists were prepared for low-pressure and moderate-temperature imprint lithography. Epoxy/silica and epoxy/titania hybrid resists were synthesized via a sol−gel process from a diglycidyl ether of bisphenol A prepolymer with a metal alkoxide precursor and a coupling agent, 3-glycidyloxypropyltrimethoxysilane. The introduction of the coupling agent results in the reinforced interfacial interaction between the epoxy resin and inorganic nanoparticles. Transmission electron microscopy analyses showed that the silica or titania particles were well-dispersed in the epoxy resin matrix on a nanometer scale without the formation of aggregates. The thermooxidative stability and the glass-transition temperature (Tg) of the epoxy/silica nanocomposite showed improvement compared with the pure epoxy resin. When 10 wt % inorganic nanoparticles were added, the etching resistance of the epoxy/silica and epoxy/titania nanocomposites increased 4 and 3.2 ti...