Preparation of epoxy/silica and epoxy/titania hybrid resists via a sol-gel process for nanoimprint lithography

Preparation of epoxy/silica and epoxy/titania hybrid resists via a sol-gel process for nanoimprint lithography
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通过溶胶-凝胶工艺制备环氧树脂/二氧化硅和环氧树脂/二氧化钛混合抗蚀剂用于纳米压印光刻

DOI:
10.1021/jp908141f
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发表时间:
2010
影响因子:
3.7
通讯作者:
S. Hsu
S. Hsu
中科院分区:
化学3区
文献类型:
--
作者:
Chun;S. Hsu

文献摘要

被引文献

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本研究制备了用于低压、中温压印的无溶剂热固化环氧/无机杂化抗蚀剂。以双酚a预聚物二缩水甘油酯醚为原料,以金属醇盐为前驱体,偶联剂3-缩水甘油氧基丙基三甲氧基硅烷为原料,采用溶胶-凝胶法制备了环氧/二氧化硅和环氧/二氧化钛杂化电阻。偶联剂的引入增强了环氧树脂与无机纳米颗粒之间的界面相互作用。透射电镜分析表明,二氧化硅或二氧化钛颗粒在纳米尺度上分散在环氧树脂基体中,没有形成聚集体。与纯环氧树脂相比,环氧/二氧化硅纳米复合材料的热氧化稳定性和玻璃化转变温度(Tg)均有提高。当无机纳米颗粒添加量为10 wt %时,环氧/二氧化硅和环氧/二氧化钛纳米复合材料的耐蚀性分别提高了4%和3.2%。
In this study, the solvent-free thermocurable epoxy/inorganic hybrid resists were prepared for low-pressure and moderate-temperature imprint lithography. Epoxy/silica and epoxy/titania hybrid resists were synthesized via a sol−gel process from a diglycidyl ether of bisphenol A prepolymer with a metal alkoxide precursor and a coupling agent, 3-glycidyloxypropyltrimethoxysilane. The introduction of the coupling agent results in the reinforced interfacial interaction between the epoxy resin and inorganic nanoparticles. Transmission electron microscopy analyses showed that the silica or titania particles were well-dispersed in the epoxy resin matrix on a nanometer scale without the formation of aggregates. The thermooxidative stability and the glass-transition temperature (Tg) of the epoxy/silica nanocomposite showed improvement compared with the pure epoxy resin. When 10 wt % inorganic nanoparticles were added, the etching resistance of the epoxy/silica and epoxy/titania nanocomposites increased 4 and 3.2 ti...