Block Copolymer Lithography
Block Copolymer Lithography
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DOI：
10.1021/ma401762n
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发表时间：
2014-01-14
期刊：
影响因子：
5.5
通讯作者：
Willson, C. Grant
中科院分区：
文献类型：
--
作者：
Bates, Christopher M.;Maher, Michael J.;Willson, C. Grant
这一观点解决了嵌段共聚物光刻的现状，并确定了该领域的主要挑战和机遇。实验和理论薄膜研究的重大进展已经使嵌段共聚物“从实验室到工厂”的转变成为核心，但关于第一代器件及以后的最佳材料，工艺和分析技术仍然存在悬而未决的问题。本文特别关注与热退火相关的进展和问题。嵌段共聚物有望改变传统的光刻分辨率增强范式从“自上而下”到“自下而上”。
This Perspective addresses the current state of block copolymer lithography and identifies key challenges and opportunities within the field. Significant strides in experimental and theoretical thin film research have nucleated the transition of block copolymers "from lab to fab", but outstanding questions remain about the optimal materials, processes, and analytical techniques for first-generation devices and beyond. Particular attention herein is focused on advances and issues related to thermal annealing. Block copolymers are poised to change the traditional lithographic resolution enhancement paradigm from "top-down" to "bottom-up".