Investigation of determinant factors of minimum operating voltage of logic gates in 65-nm CMOS
Investigation of determinant factors of minimum operating voltage of logic gates in 65-nm CMOS
复制标题
65 nm CMOS逻辑门最低工作电压的决定因素研究
DOI:
10.1109/islped.2011.5993598
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发表时间:
2011
期刊:
影响因子:
--
通讯作者:
T. Sakurai
中科院分区:
文献类型:
--
作者:
Tadashi Yasufuku;S. Iida;H. Fuketa;K. Hirairi;M. Nomura;M. Takamiya;T. Sakurai
Determinant factors of the minimum operating voltage (V<inf>DDmin</inf>) of CMOS logic gates are investigated by measurements of logic-gate chains in 65nm CMOS. V<inf>DDmin</inf> consists of a systematic component (V<inf>DDmin(SYS)</inf>) and a random variation component (V<inf>DDmin(RAND)</inf>). V<inf>DDmin(SYS)</inf> is minimized, when the logic threshold voltage of logic gates equals to half supply voltage (V<inf>DD</inf>). The tuning of the logic threshold voltage of each logic gate is achieved by the sizing of the gate width of nMOS/pMOS. V<inf>DDmin(RAND)</inf> is minimized by reducing the random threshold variation achieved by increasing the gate width or the forward body biasing. In addition, the temperature dependence of V<inf>DDmin</inf> is measured for the first time. The temperature for the worst corner analysis for V<inf>DDmin</inf> should be changed depending on the number of gate counts of logic circuits.