Programming Semiconductor Nanowire Composition with Sub-100 nm Resolution via the Geode Process
Programming Semiconductor Nanowire Composition with Sub-100 nm Resolution via the Geode Process
复制标题
通过 Geode 工艺对半导体纳米线组合物进行编程,分辨率低于 100 nm
DOI:
10.1021/acs.nanolett.1c02545
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发表时间:
2022
期刊:
影响因子:
10.8
通讯作者:
Filler, Michael A.
中科院分区:
文献类型:
--
作者:
Mujica, Maritza;Mohabir, Amar;Shetty, Pralav P.;Cline, Wesley R.;Aziz, Daniel;McDowell, Matthew T.;Breedveld, Victor;Behrens, Sven Holger;Filler, Michael A.
We demonstrate the vapor–liquid–solid growth of single-crystalline i-Si, i-Si/n-Si, and SixGe1–x/SiyGe1–ynanowires via the Geode process. By enabling nanowire growth on the large internal surface area of a microcapsule powder, the Geode process improves the scalability of semiconductor nanowire manufacturing while maintaining nanoscale programmability. Here, we show that heat and mass transport limitations introduced by the microcapsule wall are negligible, enabling the same degree of compositional control for nanowires grown inside microcapsules and on conventional flat substrates. Efficient heat and mass transport also minimize the structural variations of nanowires grown in microcapsules with different diameters and wall thicknesses. Nanowires containing at least 16 segments and segment lengths below 75 nm are demonstrated.